Expression profile for EOD32200 (EOD32200)

Description : Photosystem I reaction center subunit IV [Ensembl].

Perturbation / strain specificity : CCMP2090 (SPM: 0.41, entropy: 2.42, tau: 0.22)
Sample enrichment: CCMP379,pH8.3,F/2-Si,18C (SPM: 0.26, entropy: 3.7, tau: 0.41)

All conditions


Perturbation / strain specificity

Note: SPM calculations for this profile are done using the maximum value.